Who are we?
SILSEF is a French start-up, founded in 2010, based at Archamps Technopole on the French-Swiss border near Geneva.
We share a 2 000 m² plant with industrial wafer manufacturer Sil’tronix Silicon Technologies.
The facilities include clean rooms to provide the quality required for micro/opto-electronics and bio-medical applications.
The team includes 10 highly skilled staff, mostly qualified engineers and PhDs.
It is supported by the NILAB (Nano Imprint Laboratory), a technology platform that brings together first class academic and industrial partners. Thus, in addition to its internal resources, SILSEF can call upon wide scientific and technological resources to assess your requirements and best respond to your specifications.
1.Tailored development to technical transfer
2.Tools supply (stamps, master molds), consumables, equipment
→ Small production runs subcontracting
→ Large volumes: dedicated entity
NUCLEAR + SERS
H. Kadiri, S. Kostcheev, D. Turover, R. Salas-Montiel, K. Nomenyo, A. Gokama, G. Lerondel, “Topology assisted self-organization of colloïdal nanoparticles : application to 2D large-scale nanomastering”, Beilstein journal of nanotechnology
H. Kadiri, A. Gokarna, A. Gwiazda, A. Rumyantseva; K. Nomenyo, R. Aad, G. Lerondel, “Towards multifunctional heterostructured materials : ZnO nanowires growth on mesoscale periodically patterned Si”, Physica Status Solidi (c)
H. Teyssedre, P. Gilormini, “Extension of the natural element method to surface tension and wettability for the simulation of polymer flows at the micro and nano scales”, Journal of Non-Newtonian Fluid Mechanics
S. Zanettini, V. Gâté, E. Usureau, J. Ruscica, F. Hamouda, K. Nomenyo, L. Le Cunff, H. Kadiri, G. Lerondel, Matteo Salomini, Rosalinde Plots, E. Auffray, P. Lecoq, J. Alamo, J. Prior, A. Iltis, D. Turover, “Improved Light Extraction Efficiency on 2 inches LYSO with Nanopatterned TiO2 Photonic Crystals”