Technologies
SILSEF specializes in advanced nanopatterning technologies that enable precise surface engineering at the nanoscale. Our solutions combine cutting-edge research with industrial scalability to serve industries from optics to biomedical devices.
Nanoimprint Lithography (NIL)
Our core technology, Nanoimprint Lithography, is ranked among the MIT’s revolutionary technologies. NIL enables precise pattern transfer at the nanoscale through resist embossing, offering unmatched flexibility for patterning on diverse materials and complex geometries.
- Pattern design and simulation
- Micro and nanoscale tool manufacturing
- Large surface patterning (10s x 10s cm)
- 2.5D patterning capabilities
Nanopatterning by plastic injection moulding
Our patented breakthrough merges nanoscale precision with the scalability of plastic injection molding. This technology enables cost-effective mass production of nanopatterned components for optics, photonics, biomedical devices, and consumer electronics.
- Cost-effective scalability
- High-fidelity pattern replication
- Compatible with standard injection equipment
- Multi-material and hybrid designs
Our Capabilities
SILSEF covers the complete process flow from design to functional characterization:
1. Design & Simulation
Pattern design including simulation and modeling for your specific application
2. Tool Manufacturing
Manufacture of tools at micro and nanoscale with precision engineering
3. Pattern Transfer
Transfer patterns on various materials through etching, plastic deformation, molding, or contact printing
4. Characterization
Geometric and functional characterization including wetting properties and diffraction effects