SILSEF’s key technology is Nano Imprint Lithography (NIL) invented in 1995 in the U.S, to reduce the size of microelectronic circuits. It is ranked among the revolutionary technologies by the MIT (“Ten Technologies That can change the world”), thanks to its generic and large variety of applications.

Schematically, a polymer deposited on the surface of the material, is embossed with a nano-structured stamp. Then the pattern is transferred into the material using the deformed polymer as a disposable etching mask.  

SILSEF develops process, material and micro nano patterns to fulfill its client’s requirement. Along the years, SILSEF developed multiple solutions to be able to bring patterning on every material. We are able to pattern large surfaces (10sx10s of cm) on flat but also on 2.5D (half sphere).

SILSEF is working on the whole process flow, from the design of functional partterns (for optics or wettability) down to control process through dedicated and internally designed characterization equipments.

Our skills cover the whole technology chain to meet your expectations : 

  • Design of patterns including simulation and modelling
  • Manufacture of stamps at micro and nanoscale 
  • Transfer patterns on a range of materials
  • Geometric and functional characterizations