Etching Masks

At SILSEF, we’ve developed a process to use a sol-gel layer as an etching mask. The combination of nanoimprint lithography and sol-gel materials allows for fast and cost-effective fabrication of a structured mask without requiring the use of heavy equipments. Different proprietary sol-gel solutions are available depending on the substrate and the application.

Selective area growth Epitaxy

The same technology can be applied for the fabrication of epitaxy masks.

Selective Area Epitaxial Growth (SAEG) with SiO2 sol-gel mask