At SILSEF, we’ve developed a process to use a sol-gel layer as an etching mask. The combination of nanoimprint lithography and sol-gel materials allows for fast and cost-effective fabrication of a structured mask without requiring the use of heavy equipments. Different proprietary sol-gel solutions are available depending on the substrate and the application.
Selective area growth Epitaxy
The same technology can be applied for the fabrication of epitaxy masks.