We have developed processes to use sol-gel layers as etching masks. The combination of nanoimprint lithography and sol-gel materials allows for fast and cost-effective fabrication of a structured mask as it does not require the use of heavy equipments. Different proprietary sol-gel solutions are available depending on the substrates and the applications.
Selective Area Growth Epitaxy (SAG)
Sol gel and nanoimprint masks can also to be use for selective epitaxy.