Etching Masks

We have developed processes to use sol-gel layers as etching masks. The combination of nanoimprint lithography and sol-gel materials allows for fast and cost-effective fabrication of a structured mask as it does not require the use of heavy equipments. Different proprietary sol-gel solutions are available depending on the substrates and the applications.

Selective Area Growth Epitaxy (SAG)

Sol gel and nanoimprint masks can also to be use for selective epitaxy.

Selective Area Epitaxial Growth (SAEG) with SiO2 sol-gel mask