Technologies

SILSEF’s key technology is Nano Imprint Lithography (NIL) invented in 1995 in the U.S, to reduce the size of microelectronic circuits. It is ranked among the revolutionary technologies by the MIT (“Ten Technologies That can change the world”), thanks to its generic scope and large variety of potential applications.

At SILSEF, we have developed a groundbreaking approach to nanopatterning via plastic injection molding, protected by our proprietary patent. This innovative method merges the precision of nanoscale engineering with the scalability and cost-efficiency of plastic injection, opening new avenues for industries such as optics, photonics, biomedical devices, and consumer electronics.